Publications

20 results for Indira Seshadri

Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer
- - Indira Seshadri
  - Anuja De Silva
  - et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Development of TiO₂ containing hardmasks through PEALD deposition
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Comprehensive analysis of line-edge and line-width roughness for EUV lithography
- - Ravi Bonam
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Single-expose patterning development for EUV lithography
- - Anuja De Silva
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer
- - Indira Seshadri
  - Anuja De Silva
  - et al.
- 2017
- SPIE Advanced Lithography 2017
An OCD perspective of line edge and line width roughness metrology
- - Ravi Bonam
  - R. Muthinti
  - et al.
- 2017
- SPIE Advanced Lithography 2017
DSA patterning options for logics and memory applications
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Study of alternate hardmasks for extreme ultraviolet patterning
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2016
- JVSTB
EUV patterning successes and frontiers
- - Nelson Felix
  - Daniel Corliss
  - et al.
- 2016
- SPIE Advanced Lithography 2016