Publications

5 results for Takashi Chiba

193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- Microlithography 2005
Conference paper
Progress towards developing high performance immersion compatible materials and processes
- - Karen Petrillo
  - Kaushal Patel
  - et al.
- 2005
- Microlithography 2005
Conference paper
Design of protective topcoats for immersion lithography
- - Robert D. Allen
  - Phillip J. Brock
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Paper
Fluoroalcohol-methacrylate resists for 193nm lithography
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Paper
IBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- - Kaushal Patel
  - Margaret Lawson
  - et al.
- 2004
- Microlithography 2004
Conference paper