CD optimization methodology for extending optical lithographyC. WongG. Seevaratnamet al.2013SPIE Advanced Lithography 2013
Advanced overlay control in volume manufacturingTimothy WiltshireChristopher Ausschnittet al.2011ASMC 2011
Synthesis and control of ultra thin gate oxides for the 90 and 65 NM nodesJoseph F. Shepard Jr.Anthony Chouet al.2005RTP 2005