Predicting and reducing substrate induced focus error
- Bernhard Liegl
- Brian Sapp
- et al.
- 2010
- SPIE Advanced Lithography 2010
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4 results for Bernhard Liegl
Measuring layer-specific depth-of-focus requirements
- Bernhard Liegl
- Allen Gabor
- et al.
- 2008
- SPIE Advanced Lithography 2008
Challenges of Aluminum RIE Technology at sub 0.45 μm Pitches
- R. Ravikumar
- R. Filippi
- et al.
- 1999
- IITC 1999
Predicting substrate-induced focus error
- Bernhard Liegl
- Brian Sapp
- et al.
- 2010
- Journal of Micro/Nanolithography, MEMS, and MOEMS