A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Publications
43 results for D. Medeiros
The rational design of bleachable non-chemically amplified DUV photoactive compounds
- Benjamen M. Rathsack
- Peter I. Tattersall
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
High resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask and device making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists
- A. Mahorowala
- D. Medeiros
- 2001
- Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
- Brian Ashe
- Christina Deverich
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Recent progress in electron-beam resists for advanced mask-making
- D. Medeiros
- A. Aviram
- et al.
- 2001
- IBM J. Res. Dev
Extending the performance of KRS-XE for high throughput electron beam lithography for advanced mask making
- David R. Medeiros
- Karen E. Petrillo
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Transfer etching of bilayer resists in oxygen-based plasmas
- A. Mahorowala
- K. Babich
- et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Patterning of hyperbranched resist materials by electron-beam lithography
- Alexander R. Trimble
- David C. Tully
- et al.
- 2000
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry