Publications

43 results for D. Medeiros

Enhancement of KRS-XE for 50 keV advanced mask making applications
- - Karen Petrillo
  - David Medeiros
  - et al.
- 2002
- SPIE Photomask Technology 2002
Low-temperature melt processing of organic-inorganic hybrid films
- - David B. Mitzi
  - David R. Medeiros
  - et al.
- 2002
- Chemistry of Materials
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- - Christina Deverich
  - Andrew Watts
  - et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Intercalated organic-inorganic perovskites stabilized by fluoroaryl-aryl interactions
- - David B. Mitzi
  - David R. Medeiros
  - et al.
- 2002
- Inorganic Chemistry
Sensitivity factors of CAR electron beam resists
- - David R. Medeiros
  - Karen Petrillo
  - et al.
- 2002
- Microlithography 2002
The effect of humidity on deprotection kinetics in chemically amplified resists
- - Sean D. Burns
  - David R. Medeiros
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Characterization and acid diffusion measurements of new strong acid photoacid generators
- - G.M. Wallraff
  - Carl E. Larson
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- - Wu-Song Huang
  - Ranee Kwong
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Recent advances in the development of chemically amplified resists for applications in electron beam lithography
- - David R. Medeiros
- 2002
- J. Photopolym. Sci. Tech.
Evolution of a 193 nm bilayer resist for manufacturing
- - R.W. Kwong
  - M. Khojasteh
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering