Yield monitor for embedded-SiGe process optimization
- Xu Ouyang
- Shwu-Jen Jeng
- et al.
- 2008
- ICSICT 2008
Conference paper
Publications
2 results for X. Ouyang
High performance 45-nm SOI technology with enhanced strain, porous low-k BEOL, and immersion lithography
- S. Narasimha
- K. Onishi
- et al.
- 2006
- IEDM 2006
Conference paper