Publications

4 results for Paul A. Rabidoux

Current Developments of a High Performance CA Resist for Mask Making Application
- - Wu-Song Huang
  - Wei He
  - et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003
A high-speed, high-sensitivity silicon lateral trench photodetector
- - Min Yang
  - Kern Rim
  - et al.
- 2002
- IEEE Electron Device Letters
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- - Christina Deverich
  - Andrew Watts
  - et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
- - Brian Ashe
  - Christina Deverich
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering