Publications

2 results for Andrew Watts

Cr migration on 193nm binary photomasks
- - John Bruley
  - Geoffrey Burr
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- - Christina Deverich
  - Andrew Watts
  - et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002