Publications

3 results for Larry Zhuang

Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Overcoming the challenges of 22-nm node patterning through litho-design co-optimization
- - Martin Burkharde
  - J.C. Arnold
  - et al.
- 2009
- SPIE Advanced Lithography 2009
32 NM Logic patterning options with immersion lithography
- - K. Lai
  - S. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008