Publications

6 results for I.Y. Popova

Critical challenges for "non-critical" layers
- - J.M. Gomez
  - I.Y. Popova
  - et al.
- 2011
- SPIE Advanced Lithography 2011
A new breed of wet-developable BARC materials
- - Libor Vyklicky
  - Wu-Song Huang
  - et al.
- 2009
- J. Photopolym. Sci. Tech.
A new class of low bake resists for 193-nm immersion lithography
- - Ratnam Sooriyakumaran
  - Richard DiPietro
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Exploring acidic functionalities in the design and development of high performance 193nm photoresist polymers
- - P.R. Varanasi
  - W. Li
  - et al.
- 2007
- J. Photopolym. Sci. Tech.
Building an immersion top coat from the ground up - Materials perspective
- - Mahmoud Khojasteh
  - Irene Popova
  - et al.
- 2007
- SPIE Advanced Lithography 2007
High performance 193nm photoresists based on fluorosulfonamide
- - Wenjie Li
  - Kuang-Jung Chen
  - et al.
- 2007
- SPIE Advanced Lithography 2007