Publications

2 results for Shurong Liang

Comparative study of CVD TiN vs. ALD TiN for contact metallization in 32nm node and beyond
- - Valli Arunachalam
  - Filippos Papadatos
  - et al.
- 2010
- ADMETA 2010
Advanced metallization developments for 32-nm node CMOS technology contact architecture
- - Doug H. Lee
  - Valli Arunachalam
  - et al.
- 2009
- ADMETA 2009