Publications

2 results for Jihong Choi

Cu CMP edge uniformity improvement studies for 32 nm technology node and beyond
- - John H. Zhang
  - Laertis Economikos
  - et al.
- 2010
- MRS Online Proceedings Library
Evaluation of barrier CMP slurries and characterization of ULK material properties shifts due to CMP
- - Wei-Tsu Tseng
  - Dimitri Kioussis
  - et al.
- 2008
- ECS Meeting 2008