Publications

2 results for Jon R. Eshelman

Sensitive polysilane resists for bilayer lithography
- - G.M. Wallraff
  - R.D. Miller
  - et al.
- 1991
- ACS Spring 1991
Surface-imaged silicon polymers for 193-nm excimer laser lithography
- - Patricia A. Bianconi
  - David A. Smith
  - et al.
- 1992
- Japanese Journal of Applied Physics