Publications

10 results for Carlos Fonseca

Critical impact of mask electromagnetic effects on optical proximity corrections performance for 45 nm and beyond
- - Jaione Tirapu Azpiroz
  - Alan E. Rosenbluth
  - et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High performance 45-nm SOI technology with enhanced strain, porous low-k BEOL, and immersion lithography
- - S. Narasimha
  - K. Onishi
  - et al.
- 2006
- IEDM 2006
Mastering double exposure process window aware OPC by means of virtual targets
- - Henning Haffner
  - Zachary Baum
  - et al.
- 2006
- SPIE Photomask Technology 2006
Characterization of imaging performance for immersion lithography at NA=0.93
- - Dario Gil
  - Jaione Tirapu-Azpiroz
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Immersion lithography: New opportunities for semiconductor manufacturing
- - Darío Gil
  - Timothy A. Brunner
  - et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High-performance circuit design for the RET-enabled 65nm technology node
- - Lars Liebmann
  - Arnold Barish
  - et al.
- 2004
- AMM 2004
Layout Optimization at the pinnacle of Optical Lithography
- - Lars Liebmann
  - Greg Northrop
  - et al.
- 2003
- SPIE Advanced Microelectronic Manufacturing 2003
Optimum mask and source patterns to print a given shape
- - Alan E. Rosenbluth
  - Rama N. Singh
  - et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- - Kafai Lai
  - Gregg Gallatin
  - et al.
- 2002
- SPIE Advanced Lithography 2002
Enabling the 70 nm technology node with 193 nm altPSM lithography
- - Lars Liebmann
  - Jennifer Lund
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering