Numerical simulation of etching and deposition processes
- Satoshi Hamaguchi
- Anita A. Mayo
- et al.
- 1997
- Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Paper
Publications
19 results for David E. Kotecki
A reactive ion etch study for producing patterned platinum structures
- Curtis E. Farrell
- K.R. Milkove
- et al.
- 1997
- Integrated Ferroelectrics
PaperCharacterization, modeling, and design of an electrostatic chuck with improved wafer temperature uniformity
- Kurt A. Olson
- David E. Kotecki
- et al.
- 1995
- Review of Scientific Instruments
PaperHydrogen incorporation in silicon nitride films deposited by remote electron-cyclotron-resonance chemical vapor deposition
- David E. Kotecki
- Jonathan D. Chapple-Sokol
- 1995
- Journal of Applied Physics
PaperShallow n+ Junctions in Silicon by Arsenic Gas-Phase Doping
- J.F. DeGeolormo
- D.K. Sodana
- et al.
- 1994
- JES
PaperInterface defects of ultrathin rapid-thermal oxide on silicon
- J.H. Stathis
- D.A. Buchanan
- et al.
- 1993
- Applied Physics Letters
PaperReaction study of cobalt and silicon nitride
- Tai D. Nguyen
- Herbert L. Ho
- et al.
- 1993
- Journal of Materials Research
PaperTemperature distribution in an ideal azimuthally symmetric chemicalvapor-deposition reactor
- David E. Kotecki
- Richard A. Conti
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperTemperature optimization in an azimuthally symmetric single-wafer chemical vapor deposition reactor: The low pressure regime
- David E. Kotecki
- Steven G. Barbee
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paper