Depth profiling of the Ge concentration in SiGe alloys using in situ ellipsometry during reactive-ion etching
- G.M.W. Kroesen
- G.S. Oehrlein
- et al.
- 1993
- Journal of Applied Physics
Publications
3 results for Marco Haverlag
Ellipsometric study of silicon surface damage in electron cyclotron resonance plasma etching using CF4 and SF6
- M. Haverlag
- D. Vender
- et al.
- 1992
- Applied Physics Letters
Ion-induced fluorination in electron cyclotron resonance etching of silicon studied by x-ray photoelectron spectroscopy
- David Vender
- Marco Haverlag
- et al.
- 1992
- Applied Physics Letters