Fully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithography
- Philip J. Coane
- Kaolin G. Chiong
- et al.
- 1993
- Microlithography 1993
Conference paper
Publications
9 results for K. Chiong
A Scaled 0.25- μm Bipolar Technology Using Full e-Beam Lithography
- John D. Cressler
- James Warnock
- et al.
- 1992
- IEEE Electron Device Letters
PaperA full E-beam 0.25 mu m bipolar technology with sub-25 ps ECL gate delay
- J. Warnock
- J.D. Cressler
- et al.
- 1991
- IEDM 1991
Conference paperResist patterning for sub-quarter-micrometer device fabrications (Invited Paper)
- K. Chiong
- F.J. Hohn
- 1990
- Microlithography 1990
Conference paperSensitive electron beam resist systems based on acid-catalyzed deprotection
- Hiroshi Ito
- Lester A. Pederson
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperAqueous developable, negative working resist made of chlorinated novolac resin
- H. Hiraoka
- A.M. Patlach
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperContrast and sensitivity trade-offs of resist processing in electron beam lithography at 0.5µm and below
- W. Molzen
- Michael G. Rosenfield
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperSub-halfmicron negative resist systems by image reversal
- K. Chiong
- H. Hiraoka
- 1989
- Proceedings of SPIE 1989
Conference paper0. 5 MICRON GATE CMOS TECHNOLOGY USING E-BEAM/OPTICAL MIX LITHOGRAPHY.
- L.K. Wang
- Y. Taur
- et al.
- 1985
- VLSI Technology 1985
Conference paper