Photochemistry of Triphenylsulfonium Salts in Poly[4-[(tert-butoxycarbonyl)oxy]styrene]: Evidence for a Dual Photoinitiation Process
- Nigel P. Hacker
- Kevin M. Welsh
- 2002
- Macromolecules
Paper
Publications
9 results for Kevin M Welsh
Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- Willard Conley
- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
Conference paperTAR processing for CD control in I-line and 248 nm lithography
- Christopher Lyons
- Nicholas Eib
- et al.
- 1993
- Microlithography 1993
Conference paperPhoto-CIDNP and Nanosecond Laser Flash Photolysis Studies on the Photodecomposition of Triarylsulfonium Salts
- Kevin M. Welsh
- Miguel A. Garciagaribaya
- et al.
- 1992
- Journal of Organic Chemistry
PaperPhotochemical and photophysical studies on chemically amplified resists
- Nigel P. Hacker
- Donald C. Hofer
- et al.
- 1992
- J. Photopolym. Sci. Tech.
PaperPhotochemistry and fluorescence spectroscopy of polymeric materials containing triphenylsulfonium salts
- Nigel P. Hacker
- Kevin M. Welsh
- 1991
- SPIE San Diego 1991
Conference paperFluorescence spectroscopy and photochemistry of poly(4-tert-butoxycarbonyloxystyrene) triphenylsulfonium salt mixtures
- Nigel P. Hacker
- Kevin M. Welsh
- 1991
- ACS Spring 1991
Conference paperMechanistic studies on the poly(4-tert-butoxycarbonyloxystyrene)/triphenylsulfonium salt photoinitiation process
- Nigel P. Hacker
- Kevin M. Welsh
- 1991
- Microlithography 1991
Conference paperThe importance of cage versus escape reactivity in the photochemistry of onium salts
- Nigel P. Hacker
- John L. Dektar
- et al.
- 1991
- J. Photopolym. Sci. Tech.
Paper