Integrated Processing of MOS Gate Dielectric Structures
- G.W. Rubloff
- M. Offenberg
- et al.
- 1994
- IEEE Trans Semicond Manuf
Paper
Publications
8 results for M. Offenberg
Hydrocarbon reaction with HF-cleaned Si(100) and effects on metal-oxide-semiconductor device quality
- S.R. Kasi
- M. Liehr
- et al.
- 1991
- Applied Physics Letters
PaperSurface etching and roughening in integrated processing of thermal oxides
- M. Offenberg
- M. liehr
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperUltraclean, integrated processing of thermal oxide structures
- M. Offenberg
- M. Liehr
- et al.
- 1990
- Applied Physics Letters
PaperKinetics of silicon epitaxy using SiH4 in a rapid thermal chemical vapor deposition reactor
- M. Liehr
- C.M. Greenlief
- et al.
- 1990
- Applied Physics Letters
PaperRole of surface passivation in the integrated processing of MOS structures
- M. Offenberg
- M. Liehr
- et al.
- 1990
- VLSI Technology 1990
Conference paperHF surface passivation failure in integrated thermal oxidation processing
- M. Liehr
- M. Offenberg
- et al.
- 1990
- SSDM 1990
Conference paperEquilibrium surface hydrogen coverage during silicon epitaxy using SiH4
- C.M. Greenlief
- M. Offenberg
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper