A time-of-flight static secondary ion mass spectrometry and X-ray photoelectron spectroscopy study of 3-aminopropyltrihydroxysilane on water plasma treated chromium and silicon surfacesB.N. EldridgeL.P. Buchwalteret al.1992Journal of Adhesion Science and Technology
Absolute depth profiling of thin film systems by low energy secondary neutral mass spectrometryA. WucherH. Oechsneret al.1989Thin Solid Films
Relative elemental sensitivity factors in secondary neutral mass spectrometryA. WucherF. Novaket al.1988Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films