Charge trapping and retention in ultra-thin oxide-nitride-oxide structuresP. OlivoZ.A. Weinberget al.1991Solid State ElectronicsPaper
Oxide-Thickness Determination in Thin-Insulator MOS StructuresBruno RiccoPiero Olivoet al.1988IEEE T-EDPaper
High-Field-Induced Degradation in Ultra-Thin SiO2 FilmsPiero OlivoThao N. Nguyenet al.1988IEEE T-EDPaper
Evidence of the role of defects near the injecting interface in determining SiO2 breakdownP. OlivoB. Riccoet al.1987Applied Physics LettersPaper