In situ analysis of the formation of thin TiSi2 (<50 nm) contacts in submicron CMOS structures during rapid thermal annealing
- L. Clevenger
- C. Cabral Jr.
- et al.
- 1995
- MRS Fall Meeting 1995
Conference paper
Publications
23 results for K.F. Ludwig Jr.
In situ x-ray diffraction analysis of the C49-C54 titanium silicide phase transformation in narrow lines
- R.A. Roy
- L. Clevenger
- et al.
- 1995
- Applied Physics Letters
PaperIn-situ x-ray diffraction and resistivity analysis of CoSi2 phase formation with and without a Ti interlayer at rapid thermal annealing rates
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1994
- MRS Fall Meeting 1994
Conference paperKinetics of true mean-field Ising models and the Langevin equation: A comparison
- Karl F. Ludwig Jr.
- Byungwoo Park
- 1992
- Physical Review B
PaperDevelopment of fluctuations into domains during ordering in Fe3Al
- Byungwoo Park
- G. Brian Stephenson
- et al.
- 1992
- Physical Review Letters
PaperComment on Calculation and simulation of chemical-diffusion coefficients: The inadequacy of the mean-field theory
- Karl F. Ludwig Jr.
- Byungwoo Park
- 1992
- Physical Review Letters
ReviewInstrumentation for millisecond-resolution scattering studies (invited)
- G.B. Stephenson
- K.F. Ludwig Jr.
- et al.
- 1989
- Review of Scientific Instruments
PaperObservation of a precursor during the crystallization of amorphous nizr2
- M. Sutton
- Y.S. Yang
- et al.
- 1989
- Physical Review Letters
PaperNucleated and continuous ordering in Cu3Au
- K.F. Ludwig Jr.
- G.B. Stephenson
- et al.
- 1988
- Physical Review Letters
PaperCrystallization of amorphous NiZr2
- M. Sutton
- Y.S. Yang
- et al.
- 1988
- Materials Science and Engineering
Paper