Patterning of 100 nm features using X-ray lithography
- Azalia A. Krasnoperova
- Scott Hector
- et al.
- 1997
- J. Photopolym. Sci. Tech.
Publications
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127 results for Hiroshi Ito
193 nm photoresist r&d: the risk & challenge
- Donald C. Hofer
- Robert Allen
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Lithographic feasibility of escap beyond quarter micron
- Hiroshi Ito
- Greg Breyta
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Approach toward environmental stabilization of chemical amplification resists
- Hiroshi Ito
- William P. England
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Top surface imaging systems utilizing poly(vinylbenzoic acid) and its ester
- Hiroshi Ito
- 1992
- J. Photopolym. Sci. Tech.
Approaches to the Design of Radiation-Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
- Jean M.J. Fréchet
- Theodore G. Tessier
- et al.
- 2019
- JES
Novel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base-Developable Resist
- Hiroshi Ito
- Elizabeth Flores
- et al.
- 2019
- JES
Evaluation of Onium Salt Cationic Photoinitiators as Novel Dissolution Inhibitor for Novolac Resin
- Hiroshi Ito
- Elizabeth Flores
- 2019
- JES
A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System
- Hiroshi Ito
- L.A. Pederson
- et al.
- 2019
- JES
Thermally Developable, Positive Resist Systems with High Sensitivity
- Hiroshi Ito
- Reinhold Schwalm
- 2019
- JES