Grain growth study in aluminum films and electromigration implicationsSubramanian S. IyerC.Y. Wong1985Journal of Applied Physics
Formation of thin films of NiSi: Metastable structure, diffusion mechanisms in intermetallic compoundsF.M. D'HeurleC.S. Peterssonet al.1984Journal of Applied Physics
The poly-single crystalline silicon interfaceC.Y. WongAlwin E. Michelet al.1984Journal of Applied Physics
Grain boundary-solute interactions in polycrystalline silicon and germaniumD.A. SmithC.R.M. Grovenoret al.1984Ultramicroscopy