Thermal stability of the Al/PdxW100-x/Si contact systems
- M. Eizenberg
- R.D. Thompson
- et al.
- 1985
- Journal of Applied Physics
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27 results for R.D. Thompson
Phase transformations of alloys on a reactive substrate: Interaction of binary alloys of transition and rare-earth metals with silicon
- R.D. Thompson
- K.N. Tu
- et al.
- 1985
- Journal of Applied Physics
Effect of dopant on reaction between polycrystalline silicon and thin-film rhodium
- P.A. Psaras
- R.D. Thompson
- et al.
- 1985
- Applied Physics Letters
Structure and growth kinetics of RhSi on single crystal, polycrystalline, and amorphous silicon substrates
- P.A. Psaras
- R.D. Thompson
- et al.
- 1984
- Journal of Applied Physics
Interaction of Pd-Er alloys with silicon
- G. Ottaviani
- K.N. Tu
- et al.
- 1983
- Journal of Applied Physics
Interdiffusion in copper-aluminum thin film bilayers. I. Structure and kinetics of sequential compound formation
- H.T.G. Hentzell
- R.D. Thompson
- et al.
- 1983
- Journal of Applied Physics
Motion of W marker during sequential compound formation in bimetallic AlCu thin films
- H.T.G. Hentzell
- R.D. Thompson
- et al.
- 1983
- Materials Letters
Schottky barrier of nonuniform contacts to n-type and p-type silicon
- R.D. Thompson
- K.N. Tu
- 1982
- Journal of Applied Physics
Thermal stability and growth kinetics of Co2Si and CoSi in thin-film reactions
- K.N. Tu
- G. Ottaviani
- et al.
- 1982
- Journal of Applied Physics
A simple analysis of inert marker motion in a single compound layer for solid-phase epitaxy and for binary diffusion couples
- U. Gösele
- K.N. Tu
- et al.
- 1982
- Journal of Applied Physics