Publications

10 results for L. Stolt

Measurements of the rectifying barrier heights of the various iridium silicides with n-Si
- - J. De Sousa Pires
  - P. Ali
  - et al.
- 2008
- Applied Physics Letters
Comparison of high vacuum and ultra-high-vacuum tantalum diffusion barrier performance against copper penetration
- - L. Clevenger
  - N.A. Bojarczuk
  - et al.
- 1993
- Journal of Applied Physics
On the formation of copper-rich copper silicides
- - L. Stolt
  - F.M. D'Heurle
  - et al.
- 1991
- Thin Solid Films
Formation of Cu₃Si and its catalytic effect on silicon oxidation at room temperature
- - L. Stolt
  - A. Charai
  - et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Oxidation of titanium, manganese, iron, and niobium silicides: Marker experiments
- - L. Stolt
  - O. Thomas
  - et al.
- 1990
- Journal of Applied Physics
Room-temperature oxidation of silicon catalyzed by Cu₃Si
- - J.M.E. Harper
  - A. Charai
  - et al.
- 1990
- Applied Physics Letters
The formation of Cu₃Si: Marker experiments
- - L. Stolt
  - F.M. D'Heurle
- 1990
- Thin Solid Films
Oxidation and formation mechanisms in disilicides: VSi₂ and CrSi₂, inert marker experiments and interpretation
- - O. Thomas
  - L. Stolt
  - et al.
- 1990
- Journal of Applied Physics
Electrical characteristics of Ti-Si(100) interfaces
- - M.O. Aboelfotoh
  - L. Stolt
  - et al.
- 1989
- Thin Solid Films
Diffusion in intermetallic compounds with the CaF₂ structure: A marker study of the formation of NiSi₂ thin films
- - F.M. D'Heurle
  - S. Petersson
  - et al.
- 1982
- Journal of Applied Physics