Etching Silicon with Fluorine Gas
- M. Chen
- V.J. Minkiewicz
- et al.
- 2019
- JES
Publications
8 results for V.J. Minkiewicz
Effects of substrate bias and annealing on the properties of amorphous alloy films of Gd-Co, Gd-Fe, and Gd-Co-X (X=Mo,Cu,Au)
- Neil Heiman
- N. Kazama
- et al.
- 2008
- Journal of Applied Physics
Magnetic field control of reactive plasma etching
- V.J. Minkiewicz
- M. Chen
- et al.
- 2008
- Applied Physics Letters
Triode plasma etching
- V.J. Minkiewicz
- B.N. Chapman
- 2008
- Applied Physics Letters
The implication of flow-rate dependencies in plasma etching
- B.N. Chapman
- T.A. Hansen
- et al.
- 2008
- Journal of Applied Physics
Some mechanical and thermal properties of PECVD a-SixC1-x: H and a-SixN1-x: H films prepared by mixed frequency plasma processes
- V.J. Minkiewicz
- J. Stasiak
- et al.
- 1994
- Surface and Coatings Technology
Various Properties of sputtered TaxAlt-x films
- V.J. Minkiewicz
- J.O. Moore
- et al.
- 1993
- MRS Fall Meeting 1993
Some Factors Affecting Hillock Formation due to PECVD Processing of Sputtered Al-4% Cu-1% Si Films
- V.J. Minkiewicz
- J.O. Moore
- et al.
- 1992
- JES