Poly(Methyl Methacrylate-isobutylene) Copolymers as Highly Sensitive Electron Beam Resists
- Edward Gipstein
- Wayne Moreau
- et al.
- 2019
- JES
Paper
Publications
5 results for Omar Need
Parameters, affecting the sensitivity of poly(methyl methacrylate) as a positive lithographic resist
- Edward Gipstein
- Augustus C. Ouano
- et al.
- 2004
- Polymer Engineering & Science
PaperThe synthesis and evaluation of cyclic olefin sulfone copolymers and terpolymers as electron beam resists
- Edward Gipstein
- Wayne Moreau
- et al.
- 2003
- Journal of Applied Polymer Science
PaperDirect measurement of spin-dependent conduction-electron mean free paths in ferromagnetic metals
- Bruce A. Gurney
- Virgil S. Speriosu
- et al.
- 1993
- Physical Review Letters
PaperDifferential scanning calorimetric study of the Transition heats of some dibenzazepines, carbazoles and phenothiazines
- Edward Gipstein
- Edward M. Barrall II
- et al.
- 1972
- Thermochimica Acta
Paper