PaperLaser Desorption Mass Spectrometry of PolysilanesThomas F. Magnera, V. Balaji, et al.Macromolecules
PaperQuantitative Analysis of a Mixture of tert-Butyl Hydroperoxide, tert-Butyl Peroxide, and tert-Butyl Alcohol by Carbon-13 Nuclear Magnetic Resonance SpectrometryWilliam W. Fleming, Scott A. MacDonaldAnalytical Chemistry
PaperDevelopment of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymersThomas I. Wallow, P.J. Brock, et al.SPIE Advances in Resist Technology and Processing 1999
Conference paper193-nm negative resist based on acid-catalyzed elimination of polar moleculesR. Sooriyakumaran, B. Davis, et al.Microlithography 2004
