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Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
The purpose of this paper is to provide multiresolution analysis, stationary subdivision and pre-wavelet decomposition on L2(Rd) based on a general class of functions which includes polyharmonic B-splines. © 1991 J.C. Baltzer A.G. Scientific Publishing Company.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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