Using phthalocyanine precursors to prepare oxide thin films: decoupling the growth rate from the evaporation rate

E. Machler; F. Arrouy; E. Fritsch; J.G. Bednorz; H. Berke; J.R. Huber; J.P. Locquet

doi:10.1063/1.119837

Applied Physics Letters

Paper

04 Aug 1997

Using phthalocyanine precursors to prepare oxide thin films: decoupling the growth rate from the evaporation rate

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Abstract

A new type of precursor, phthalocyanine, for the growth of thin films is proposed. The use of this precursor is illustrated by the growth of CuO and YBa2Cu3O7. Several advantages and implication of this novel deposition process are summarized.

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La_2-xSr_xCuO₄ thin films and multilayers prepared by MBE

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Physica C: Superconductivity and its applications

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Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine

E. Fritsch, E. Mächler, et al.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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Benzoylpivaloylmethanide Precursors for the Chemical Beam Epitaxy of Oxide Thin Films. 1. Synthesis, Characterization, and Use of Yttrium Benzoylpivaloylmethanide

E. Fritsch, E. Mächler, et al.

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