The DX centre
T.N. Morgan
Semiconductor Science and Technology
The roughness of spin-cast polymer films arises from thermally activated capillary waves during preparation and typically amounts to about 0.5 nm rms measured on a micrometer-sized surface area. Templating from atomically flat mica substrates allows the creation of polymer films with a surface roughness approaching the molecular scale. Three regimes of spatial frequencies are identified in which the roughness is controlled by different physical mechanisms. We find that frozen-in elastic pressure waves ultimately limit the flatness of polymer films. © 2009 American Chemical Society.
T.N. Morgan
Semiconductor Science and Technology
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
Kigook Song, Robert D. Miller, et al.
Macromolecules