Patterning of highly conducting polyaniline films
T. Graham, A. Afzali, et al.
Microlithography 2000
For a set S of intervals, the clique-interval IS is defined as the interval obtained from the intersection of all the intervals in S, and the clique-width quantity wS is defined as the length of IS. Given a set S of intervals, it is straightforward to compute its clique-interval and clique-width. In this paper we study the problem of partitioning a set of intervals in order to maximize the sum of the clique-widths of the partitions. We present an O(n log n) time algorithm for the balanced bipartitioning problem, and an O(kn2) time algorithm for the k-way unbalanced partitioning problem.
T. Graham, A. Afzali, et al.
Microlithography 2000
Martin Charles Golumbic, Renu C. Laskar
Discrete Applied Mathematics
Arnon Amir, Michael Lindenbaum
IEEE Transactions on Pattern Analysis and Machine Intelligence
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010