Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The low-temperature behaviour of the resistance of indium oxide samples is discussed within the framework of localisation theories. It is demonstrated that, in three dimensions, the interplay between the effective inelastic diffusion length lin and the correlation length xi determines the nature of the diffusion process. A crossover to two-dimensional behaviour is observed once lin becomes comparable with the sample thickness.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
T.N. Morgan
Semiconductor Science and Technology
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals