S. Purushothaman, S.V. Nitta, et al.
Technical Digest-International Electron Devices Meeting
This paper describes a unique, highly flexible and cost competitive method to fabricate microelectronic packages that require thin film interconnections. The method involves fabricating thin film metal/polymer structures multi-up on a reusable temporary glass carrier and later transferring the thin film stack onto product substrates of choice. The final product substrate can be silicon, co-fired alumina or glass-ceramic, aluminum nitride, diamond or a printed wiring board. Optionally, one can also use the released thin film decal as a flexible high wireability interconnect by itself, as an interposer, or in applications like wafer level testing for known good die (KGD). The thin film wiring structure can be fabricated multi-up on large area glass plates using large format tools to significantly reduce cost.
S. Purushothaman, S.V. Nitta, et al.
Technical Digest-International Electron Devices Meeting
B.K. Furman, H.M. Clearfield, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
R.S. Rai, S.K. Kang, et al.
ECTC 1995
A.C. Callegan, K. Babich, et al.
Microelectronic Engineering