R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
Thin film deposition with physical vapor deposition (PVD) and related technology was studied. Variations of PVD processes include thermal evaporation, physical sputtering, laser ablation and arc-based emission. The modifications included reactive sputter deposition, the unbalanced magnetron, collimated and ionized sputter deposition.
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
J.Z. Sun
Journal of Applied Physics
J.C. Marinace
JES