Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
Measurements of thermoelectric power versus temperature of (CH)x doped with various concentrations of AsF5 are reported. These reflect the semiconductor-metal transition at ∼ 1% doping. The "pristine" thermopower is consistent with the conductivity-derived activation energy of 0.35 eV, and a residual defect/impurity carrier concentration of 0.1%. An analysis of the conductivity based on these data indicates that, while the disorder is certainly important, it is not the cause of the transition. © 1980.
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
J.C. Marinace
JES