Sonia Cafieri, Jon Lee, et al.
Journal of Global Optimization
No abstract available.
Sonia Cafieri, Jon Lee, et al.
Journal of Global Optimization
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Yao Qi, Raja Das, et al.
ISSTA 2009
Charles H. Bennett, Aram W. Harrow, et al.
IEEE Trans. Inf. Theory