Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
The authors' Numerically INtensive JAva programming environment shows that Java can be made to produce Fortran- and C-like performance for applications involving high-performance numerical computing.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Renu Tewari, Richard P. King, et al.
IS&T/SPIE Electronic Imaging 1996
Kento Tsubouchi, Yosuke Mitsuhashi, et al.
npj Quantum Information
Rajeev Gupta, Shourya Roy, et al.
ICAC 2006