PaperFundamental investigations of the free radical copolymerization and terpolymerization of maleic anhydride, norbornene, and norbornene tert-butyl ester: In-situ mid-infrared spectroscopic analysisA.J. Pasquale, R.D. Allen, et al.Macromolecules
PaperEvolution of a 193 nm bilayer resist for manufacturingR.W. Kwong, M. Khojasteh, et al.Proceedings of SPIE-The International Society for Optical Engineering
Conference paperDissolution/swelling behavior of cycloolefin polymers in aqueous baseHiroshi Ito, R.D. Allen, et al.Microlithography 2000
PaperApproaches to etch resistant 193-nm photoresists: Performance and prospectsR.D. Allen, Juliann Opitz, et al.SPIE Advances in Resist Technology and Processing 1999
