Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Amorphous 3d-RE films are investigated by magneto-optic Kerr rotation (KR) and by threshold photoemission (TP) of spin polarized electrons. For the first time, surface and subsurface hysteresis loops have been obtained by TP. There is a significant temperature-dependent difference between TP and KR. Applications with respect to magnetooptic recording media are discussed. © 1986.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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SPIE Advances in Semiconductors and Superconductors 1990
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010