PaperProperty modifications of nanoporous pSiCOH dielectrics to enhance resistance to plasma-induced damageE. Todd Ryan, Stephen M. Gates, et al.Journal of Applied Physics
ReviewProgress in the development and understanding of advanced low k and ultralow k dielectrics for very large-scale integrated interconnects - State of the artAlfred Grill, Stephen M. Gates, et al.Applied Physics Reviews
Conference paperOptimizing ULK film properties to enable BEOL integration with TDDB reliabilityE. T. Ryan, Deepika Priyadarshini, et al.IITC/MAM 2015
PaperCorrosion in low dielectric constant Si-O based thin films: Buffer concentration effectsF.W. Zeng, Stephen M. Gates, et al.AIP Advances
