J.Y.T. Wei, N.C. Yeh, et al.
Journal of Applied Physics
We report on the preparation of YBCO thin films by single target ion-beam deposition. A YBCO film deposited in-Situ on LaAI03, at a substrate temperature of 675°C and assisted by an atomic oxygen source, had a Tc of 80K. A YBCO film deposited in-Situ on LaAI03, at a substrate temperature of 750°C and assisted by a molecular oxygen source, had a Tcof 83K. A YBCO film deposited on a room temperature MgO substrate and followed by exsitu post annealing had a Tcof 80K. The properties of these films were studied through microscopy, stoichiometry, x-ray diffraction, Auger analysis and Tcmeasurements. © 1991 IEEE
J.Y.T. Wei, N.C. Yeh, et al.
Journal of Applied Physics
G.Q. Gong, A. Gupta
Physical Review B - CMMP
T.R. McGuire, S.J. La Placa, et al.
Journal of Applied Physics
R. Gross, A. Gupta, et al.
Applied Physics Letters