A. Skumanich
SPIE OE/LASE 1992
Paper
Sturm-Liouville systems with potentials 0.5 cos 2nx
Abstract
No abstract available.
Related
Vladimir Yanovski, Israel A. Wagner, et al.
Ann. Math. Artif. Intell.
Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008