Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This paper is concerned with the numerical integration of ordinary differential equations of the order x. Sufficient conditions and also necessary ones are given for the s-th difference quotient of the approximate solution to approach the s-th derivative of the exact solution for s >0. This requires a more subtle examination of the multiplicities of the characteristic roots of modulus 1. © 1966 Springer-Verlag.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Kenneth L. Clarkson, K. Georg Hampel, et al.
VTC Spring 2007
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009