SELF-ALIGNED PROCESSES FOR THE GaAs GATE FET.
H. Baratte, D.C. La Tulipe, et al.
IEDM 1985
Using the model of an infinite well we have performed detailed calculations of the valence-band structure and for the first time obtained analytic expressions for wave functions in a strained quantum well. In-plane effective masses and energy separations are calculated for different thicknesses of InGaAs wells and In mole fractions in the range of 0 to 0.50. Based on the calculations we estimate the optimal thickness of the well and In mole fraction for which the energy separation between the lowest two subbands has a maximum and the InGaAs layer is stable with respect to misfit dislocations. The results provide useful guidelines for the optimization of strained p-channel field-effect transistors.
H. Baratte, D.C. La Tulipe, et al.
IEDM 1985
D.J. Frank, S.E. Laux, et al.
IEDM 1992
Y. Taur, Y. Mii, et al.
IBM J. Res. Dev
D.A. Grützmacher, T.O. Sedgwick, et al.
Journal of Electronic Materials