Mustafa B. Akbulut, Faruk Dirisaglik, et al.
DRC 2014
Introduction: The ultrafast (∼tens of ns switching time) metal-insulator transition (MIT) VO2 switches reported here show excellent RF performance in a very wide frequency range (DC-40 GHz), relatively low actuation voltage (∼12 V), higher yield and much simpler fabrication process compared to classic RF MEMS counterparts. For the first time, CMOS compatible VO2 microwave switches on high resistivity silicon (HR-Si) substrate are successfully fabricated, overcoming traditional inhomogeneity issues of the SiO2/Si film ascribed to lattice mismatch [1] which used to show less sharp MIT than with Al2O3 substrates [2]. We demonstrate VO2 on SiO2/Si technology presenting 100% yield for switches with flat -0.6 dB S21-ON response and S 21-OFF better than -10 dB across the entire operating range performing better than state-of-the-art for such wide frequency range (2.95 dB up to 13.5 GHz [3]). Furthermore, the devices withstand 109 voltage actuation cycles without failure or significant degradation in S21-ON (limited to 107 cycles in [4]). The proposed solid-state MIT switches open new design and performance opportunities for wideband reconfigurable electronics and tunable RF filters, compared to state-of-the-art RF MEMS. © 2014 IEEE.
Mustafa B. Akbulut, Faruk Dirisaglik, et al.
DRC 2014
Pritish Narayanan, Geoffrey W. Burr, et al.
DRC 2014
Timothy Phung, Aakash Pushp, et al.
DRC 2014
Alvaro Padilla, Geoffrey W. Burr, et al.
DRC 2014