U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures
A model for reactive Schottky barrier formation is proposed and applied to silicide contacts on silicon. Approximate workfunctions calculated assuming a silicon excess near the silicide/silicon interface reconcile measured barrier heights with a simple Schottky description of their energetics. © 1980.
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
A. Reisman, M. Berkenblit, et al.
JES
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering