Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We describe and analyze a new digital signature scheme. The new scheme is quite efficient, does not require the the signer to maintain any state, and can be proven secure against adaptive chosen message attack under a reasonable intractability assumption, the so-called strong RSA assumption. Moreover, a hash function can be incorporated into the scheme in such a way that it is also secure in the random oracle model under the standard RSA assumption. © 2000, ACM. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
N.K. Ratha, A.K. Jain, et al.
Workshop CAMP 2000
Lerong Cheng, Jinjun Xiong, et al.
ASP-DAC 2008
M.F. Cowlishaw
IBM Systems Journal